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Ion beam etching is a highly directional process.
1.
Ion beam etching is a highly directional process.
A.
True
B.
False
Answer» B. False
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Related MCQs
Dry etch process is also used for resist stripping.
Which of the following is a combination of two other processes?
Ion beam etching is a highly directional process.
For etching of aluminium, which of the following is used as etchant?
Which of the following holds true about wet etching?
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