1.

If P is passivation, Q is n-well implant, R is metallization and S is source/drain diffusion, then the order in which they are carried out in a standard n-well CMOS fabrication process is

A. S - R - Q - P
B. R - P - S - Q
C. Q - S - R - P
D. P - Q - R - S
Answer» C. Q - S - R - P


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