MCQOPTIONS
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MCQOPTIONS
This section includes 6 Mcqs, each offering curated multiple-choice questions to sharpen your Linear Integrated Circuit knowledge and support exam preparation. Choose a topic below to get started.
| 1. |
Which component is not used as an impurity in diffusion process? |
| A. | Phosphorous |
| B. | Boron chloride |
| C. | Phosphorous pentaoxide |
| D. | Boron oxide |
| Answer» B. Boron chloride | |
| 2. |
In the fabrication of monolithic ICs, Boron chloride is added as an impurity in the diffusion process. Find the diffusion time, if the furnace is heated up to 1200oc. |
| A. | 1 hour |
| B. | 2 hours |
| C. | 45 minutes |
| D. | 30 minutes |
| Answer» C. 45 minutes | |
| 3. |
Which of the following is added as an impurity to p-type material in diffusion process? |
| A. | Phosphorous pentaoxide (P<sub>2</sub>O<sub>5</sub>) |
| B. | Phosphorous oxychloride (POcl<sub>3</sub>) |
| C. | Boron oxide (B<sub>2</sub>O<sub>3</sub>) |
| D. | None of the mentioned |
| Answer» D. None of the mentioned | |
| 4. |
For photographic purpose usually coordinatograph is preferred for artwork because, |
| A. | It is a precision drafting machine |
| B. | Cutting head can be positioned accurately |
| C. | It can be moved along two perpendicular axes |
| D. | All of the mentioned |
| Answer» E. | |
| 5. |
Find the area of artwork done for a monolithic chip of area 30mil 30mil. |
| A. | 16 cm 16 cm |
| B. | 60 cm 60 cm |
| C. | 12 cm 12 cm |
| D. | 36 cm 36 cm |
| Answer» E. | |
| 6. |
The process involved in photolithography is |
| A. | Making of a photographic mask only |
| B. | Photo etching |
| C. | Both photo etching and making of photographic mask |
| D. | None of the mentioned |
| Answer» D. None of the mentioned | |